Depth profile investigation of the incorporated iron atoms during Kr+ ion beam sputtering on Si (001)
- Author
- KHANBABAEE, B1 ; AREZKI, B1 ; BIERMANNS, A1 ; CORNEJO, M2 ; HIRSCH, D2 ; LÜTZENKIRCHEN-HECHT, D3 ; FROST, F2 ; PIETSCH, U1
[1] Solid State Physics, University of Siegen, 57068 Siegen, Germany
[2] Leibniz-Institut für Oberflächenmodifizierung e. V. (IOM), Permoserstrasse 15, 04318 Leipzig, Germany
[3] Abteilung Physik, Bergische Universität Wuppertal, 42097 Wuppertal, Germany - Source
Thin solid films. 2013, Vol 527, pp 349-353, 5 p ; ref : 28 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Author keyword
- Depth profile Nano-patterning Silicon Sputtering X-ray absorption near edge spectroscopy X-ray reflectivity
- Keyword (fr)
- Absorption RX Angle incidence Composition phase Dépôt pulvérisation Erosion Etat surface Etude théorique Faisceau ion Fer Formation motif Incidence rasante Microscopie force atomique Modélisation Profil profondeur Profondeur pénétration Pulvérisation faisceau ionique Pulvérisation irradiation Réflexion RX Silicium Siliciure Spectrométrie SIMS XANES 6855L 6855N 8115J 8116R Si Substrat silicium
- Keyword (en)
- X-ray absorption Incidence angle Phase composition Sputter deposition Erosion Surface states Theoretical study Ion beams Iron Patterning Grazing incidence Atomic force microscopy Modelling Depth profiles Penetration depth Ion beam sputtering Sputtering X-ray reflection Silicon Silicides Secondary ion mass spectrometry XANES
- Keyword (es)
- Composición fase Incidencia rasante Pulverización haz iónico Espectrometría SIMS
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55L Defects and impurities: doping, implantation, distribution, concentration, etc
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55N Composition and phase identification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15J Ion and electron beam-assisted deposition; ion plating
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A16 Methods of nanofabrication / 001B80A16R Nanoscale pattern formation
- Discipline
- Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 27100968
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.tsf.2012.12.055 
https://dx.doi.org/10.1016/j.tsf.2012.12.055
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