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The plasma nitriding treatment of TiN/TiCN multilayer films

Author
JIANYUN ZHENG1 2 ; JUNYING HAO1 ; XIAOQIANG LIU1 2 ; QIUYU GONG1 2 ; WEIMIN LIU1
[1] State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China
[2] Graduate University of Chinese Academy of Science, Beijing 100049, China
Source

Applied surface science. 2013, Vol 268, pp 195-203, 9 p ; ref : 50 ref

ISSN
0169-4332
Scientific domain
General chemistry, physical chemistry; Crystallography; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
Plasma-nitriding treatment Structure and properties The diffusion of the amorphous C Thick TiN/TiCN multilayer films
Keyword (fr)
Composé de métal de transition Composé minéral Diffusion(transport) Etat amorphe Multicouche Nitruration Traitement par plasma
Keyword (en)
Transition element compounds Inorganic compounds Diffusion Amorphous state Multilayers Nitridation Plasma assisted processing
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology

Discipline
Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
27129075

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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