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The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering

Author
BOYDENS, F1 ; LEROY, W. P1 ; PERSOONS, R2 ; DEPLA, D1
[1] Research Group DRAFT, Department of Solid State Sciences, Ghent University, Krijgslaan 281 (SI) 9000 Gent, Belgium
[2] VITO, Boeretang 200 2400 Mo, Belgium
Source

Thin solid films. 2013, Vol 531, pp 32-41, 10 p ; ref : 31 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Metallurgy, welding; Condensed state physics
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
Angular distribution Magnetron sputtering Powder targets Sputter yield
Keyword (fr)
Argent Cuivre Distribution angulaire Dépôt physique phase vapeur Dépôt pulvérisation Morphologie surface Méthode Monte Carlo Pulvérisation cathodique Titane Trajectoire 6855J 8115C
Keyword (en)
Silver Copper Angular distribution Physical vapor deposition Sputter deposition Surface morphology Monte Carlo methods Cathode sputtering Titanium Trajectories
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering

Discipline
Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
27184655

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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