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Characteristics of transparent conductive Al-doped ZnO and Ag―Ti tri-layer thin films prepared by multi-target magnetron sputtering

Author
SHIH, W. C1 ; KAO, K. S1 ; CHENG, D. L1 ; CHUNG, C. J2 ; HSIEH, P. T2 ; OU, S. L3
[1] Department of Computer and Communication, SHU-TE University, Kaohsiung, Taiwan, Province of China
[2] Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan, Taiwan, Province of China
[3] Department of Materials Science and Engineering, National Chung Hsing University, Taichung, Taiwan, Province of China
Source

Surface & coatings technology. 2013, Vol 219, pp 139-143, 5 p ; ref : 34 ref

CODEN
SCTEEJ
ISSN
0257-8972
Scientific domain
General chemistry, physical chemistry; Metallurgy, welding
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
AZO Ag-Ti Multilayers Transparent conductive coatings
Keyword (fr)
Couche mince Dopage Dépôt physique phase vapeur Magnétron Multicouche Pulvérisation irradiation Revêtement conducteur Traitement surface
Keyword (en)
Thin films Doping Physical vapor deposition Magnetrons Multilayers Sputtering Conductive coating Surface treatments
Keyword (es)
Doping Revestimiento conductor
Keyword (de)
Dopen
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11C Production techniques / 001D11C06 Surface treatment

Discipline
Metals. Metallurgy Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
27193756

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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