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Recent advances in 193 nm single-layer photoresists based on alternating copolymers of cycloolefins

Author
HOULIHAN, F. M1 ; WALLOW, T1 ; TIMKO, A1 ; NERIA, E1 ; HUTTON, R1 ; CIRELLI, R1 ; NALAMASU, O1 ; REICHMANIS, E1
[1] Bell Laboratories, Lucent Technologies, 600 Mountain Avenue, Murray Hill, NJ, United States
Conference title
Advances in resist technology and processing XIV (Santa Clara CA, 10-12 March 1997)
Conference name
Advances in resist technology and processing. Conference (14 ; Santa Clara CA 1997-03-10)
Author (monograph)
Tarascon-Auriol, Régine G (Editor)
Source

SPIE proceedings series. 1997, pp 84-91 ; ref : 10 ref

ISBN
0-8194-2463-3
Scientific domain
Electronics; Optics; Physics; Telecommunications
Publisher
SPIE, Bellingham WA
Publication country
International
Document type
Conference Paper
Language
English
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
2732067

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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