Mitigation of ion and particulate emission from laser-produced plasmas used for extreme ultraviolet lithography
- Author
- DI LAZZARO, Paolo1 ; BOLLANTI, Sarah1 ; FLORA, Francesco1 ; MEZI, Luca1 ; MURRA, Daniele1 ; TORRE, Amalia1
[1] ENEA Frascati Research Centre, Technical Unit APRAD, P.O. Box 65, 00044 Frascati, Rome, Italy - Issue title
- 5th Workshop on Plasma Production by Laser Ablation (PPLA2011)
- Author (monograph)
- MEZZASALMA, Angela Maria (Editor)
- Source
Applied surface science. 2013, Vol 272, pp 13-18, 6 p ; ref : 21 ref
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Author keyword
- Debris mitigation systems Excimer lasers Extreme ultraviolet lithography Laser-plasma sources
- Keyword (fr)
- Emission ionique Laser excimère Lithographie Plasma produit par laser Rayonnement UV extrême Source plasma
- Keyword (en)
- Ion emission Excimer lasers Lithography Laser-produced plasma Extreme ultraviolet radiation Plasma sources
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology
- Discipline
- Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 27423770
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.apsusc.2012.03.155 
https://dx.doi.org/10.1016/j.apsusc.2012.03.155
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