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Reflectance, transmittance, and absorbance of ZnO implanted with 60 keV Sn + ions

Author
DANG, Giang T1 ; KAWAHARAMURA, Toshiyuki2 ; NITTA, Noriko2 ; HIRAO, Takashi2 ; YOSHIIE, Toshimasa3 ; TANIWAKI, Masafumi1
[1] Department of Environmental Systems Engineering, Kochi University of Technology, Kami, Kochi 782-8502, Japan
[2] Research Institute for Nano-devices, Kochi University of Technology, Kami, Kochi 782-8502, Japan
[3] Research Reactor Institute, Kyoto University, Kumatori-cho, Osaka 596-0821, Japan
Conference title
The Eleventh International Workshop on Plasma-Based Ion Implantation and Deposition, 8-12 September 2011, Harbin, China
Conference name
PBII&D International Workshop on Plasma-Based Ion Implantation and Deposition (11 ; Harbin 2011-09-08)
Author (monograph)
YUKIMURA, Ken (Editor)1 2 ; CHU, Paul K (Editor)3 ; MA, Xinxin (Editor)4 ; TIAN, Xiubo (Editor)4
[1] National Institute of Advanced Industrial Science and Technology, Japan Harbin Institute of Technology, China
[2] Southwest Jiatong University, China
[3] City University of Hong Kong, Hong-Kong
[4] Harbin Institute of Technology, China
Source

Surface & coatings technology. 2013, Vol 229, pp 125-129, 5 p ; ref : 17 ref

CODEN
SCTEEJ
ISSN
0257-8972
Scientific domain
General chemistry, physical chemistry; Metallurgy, welding
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Conference Paper
Language
English
Author keyword
Absorbance Deep-level PL Implantation Reflectance Transmittance ZnO
Keyword (fr)
Traitement surface
Keyword (en)
Surface treatments
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
27662613

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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