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Structure and stability of patterned self-assembled films of octadecyltrichlorosilane formed by contact printing

Author
NOO LI JEON1 ; FINNIE, K2 ; BRANSHAW, K2 ; NUZZO, R. G1
[1] Department of Materials Science & Engineering, School of Chemical Sciences, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States
[2] The Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States
Source

Langmuir. 1997, Vol 13, Num 13, pp 3382-3391 ; ref : 66 ref

CODEN
LANGD5
ISSN
0743-7463
Scientific domain
Biochemistry, molecular biology, biophysics; General chemistry, physical chemistry; Nanotechnologies, nanostructures, nanoobjects; Polymers, paint and wood industries
Publisher
American Chemical Society, Washington, DC
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Adsorption liquide solide Alumine Assemblage moléculaire Autoassemblage Couche mince Etude expérimentale Interface liquide solide Silane organique Silice Structure Silane(stéaryl trichloro)
Keyword (en)
Liquid solid adsorption Alumina Molecular assembly Self assembly Thin film Experimental study Liquid solid interface Organic silane Silica Structure
Keyword (es)
Adsorción líquido sólido Alúmina Ensamble molecular Autoensamble Capa fina Estudio experimental Interfase líquido sólido Silano orgánico Sílice Estructura
Classification
Pascal
001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry / 001C01I Surface physical chemistry / 001C01I03 Solid-liquid interface

Discipline
General chemistry and physical chemistry
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
2771268

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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