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Structuring of photosensitive material below diffraction limit using far field irradiation

Author
NATARAJA SEKHAR YADAVALLI1 ; SAPHIANNIKOVA, Marina2 ; LOMADZE, Nino1 ; GOLDENBERG, Leonid M3 ; SANTER, Svetlana1
[1] Department of Experimental Physics, Institute for Physics and Astronomy, University of Potsdam, Karl-Liebknecht Str. 24/25, 14476 Potsdam, Germany
[2] Leibniz Institute of Polymer Research Dresden, 01069 Dresden, Germany
[3] University of Applied Sciences Wildau, Bahnhofstrasse, 15745 Wildau, Germany
Source

Applied physics. A, Materials science & processing (Print). 2013, Vol 113, Num 2, pp 263-272, 10 p ; ref : 49 ref

ISSN
0947-8396
Scientific domain
Electronics; Optics; Condensed state physics
Publisher
Springer, Heidelberg
Publication country
Germany
Document type
Article
Language
English
Keyword (fr)
Composé azoïque Formation nanomotif Matériau photosensible Microscopie force atomique Polymère photosensible limite diffraction
Keyword (en)
Azo compounds Nanopatterning Photosensitive material Atomic force microscopy Light sensitive polymer diffraction limit
Keyword (es)
Formacíon nanomotivo Material fotosensible Polímero fotosensible
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B70 Optical materials / 001B40B70G Light-sensitive materials

Pacs
4270G Light-sensitive materials

Discipline
Physics : optics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
27779745

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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