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Influence of ternary elements (X = Si, B, Cr) on TiAlN coating deposited by magnetron sputtering process with single alloying targets

Author
DUCK HYEONG JUNG1 2 ; KYOUNG IL MOON1 ; SEUNG YONG SHIN1 ; CAROLINE SUNYONG LEE2
[1] Korea Institute of Industrial Technology, Heat & Surface Technology Service Center, Incheon, 426-791, Korea, Republic of
[2] Department of Materials Engineering, Hanyang University, Gyeonggi-do, 426-791, Korea, Republic of
Conference title
The proceedings of International Union of the Materials Research Society - International Conference in Asia 2012- IUMRS-ICA 2012
Conference name
IUMRS-ICA 2012 International Union of the Materials Research Society - International Conference in Asia 2012 (Bangalore 2013-12-16)
Author (monograph)
KIM, Doyoung (Editor)1 ; KANG, Hyunil (Editor)2 ; LEE, Taeyoon (Editor)3
International Union of the Materials Research Society (IUMRS), McKeesport, PA 15135, United States (Organiser of meeting)
Materials Research Society Korea (MRS-K), Seoul, Korea, Republic of (Organiser of meeting)
[1] Ulsan College, Korea, Republic of
[2] Hanbat University, Korea, Republic of
[3] Yonsei University, Korea, Republic of
Source

Thin solid films. 2013, Vol 546, pp 242-245, 4 p ; ref : 18 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Metallurgy, welding; Condensed state physics
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Conference Paper
Language
English
Author keyword
Adding third elements (Si, B, and Cr) Magnetron sputtering process Nano-composite coating Single alloying target Ti-Al-X-N ternary coatings
Keyword (fr)
Alliage mécanique Alliage(action) Coefficient frottement Corrosion Densité courant Diffractomètre RX Dureté Dépôt physique phase vapeur Dépôt pulvérisation Emission champ Frittage Microscopie électronique balayage Microstructure Propriété mécanique Pulvérisation cathodique Relation structure propriété Revêtement composite Résistance corrosion Usure corrosive 6855J 6860B 7970 8115C
Keyword (en)
Mechanical alloying Alloying Friction factor Corrosion Current density X-ray diffractometers Hardness Physical vapor deposition Sputter deposition Field emission Sintering Scanning electron microscopy Microstructure Mechanical properties Cathode sputtering Property structure relationship Composite coating Corrosion resistance Corrosive wear
Keyword (es)
Relación estructura propiedad Revestimiento compuesto Desgaste corrosivo
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness

Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H60 Physical properties of thin films, nonelectronic / 001B60H60B Mechanical and acoustical properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70I Electron and ion emission by liquids and solids; impact phenomena / 001B70I70 Field emission, ionization, evaporation, and desorption

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering

Discipline
Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
27875257

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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