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The annealing behavior of hydrogen implanted into Al-1.5 at.% Si alloy

Author
OGURA, M1 ; NAKATANI, N1 ; YAMAJI, N1 ; IMAI, M1 ; ITOH, A1 ; IMANISHI, N1
[1] Department of Nuclear Engineering, Kyoto University, Sakyo, Kyoto 606-01, Japan
Conference name
International Symposium on Advanced Nuclear Energy Research (7 ; Takasaki 1996-03-18)
Source

Radiation physics and chemistry (1993). 1997, Vol 49, Num 6, pp 645-649 ; ref : 11 ref

ISSN
0969-806X
Scientific domain
General chemistry, physical chemistry
Publisher
Elsevier, Oxford
Publication country
United Kingdom
Document type
Conference Paper
Language
English
Keyword (fr)
Addition hydrogène Alliage base aluminium Alliage binaire Distribution concentration Défaut cristallin Effet température Etude expérimentale Implantation ion Joint grain Piégeage Profil profondeur Recuit Silicium alliage
Keyword (en)
Hydrogen additions Aluminium base alloys Binary alloys Concentration distribution Crystal defects Temperature effects Experimental study Ion implantation Grain boundaries Trapping Depth profiles Annealing Silicon alloys
Keyword (es)
Distribución concentración
Keyword (de)
Konzentrationsverteilung
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography / 001B60A72 Defects and impurities in crystals; microstructure / 001B60A72W Doping and impurity implantation in other materials

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy

Discipline
Metals. Metallurgy Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
2789598

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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