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Material properties of Pb1-xSnxSe epilayers on Si and their correlation with the performance of infrared photodiodes

Author
FACH, A1 ; JOHN, J1 ; MÜLLER, P1 ; PAGLINO, C1 ; ZOGG, H1
[1] Thin Film Physics Group, Institute of Quantum Electronics, Swiss Federal Institute of Technology, ETH-Teil Technopark, 8005 Zürich, Switzerland
Conference title
Creep and stress relaxation in miniature structures and components
Conference name
Materials Week'96. Symposium (Cincinnati, Ohio 1996-10-08)
Author (monograph)
Minerals, Metals and Materials Society. Structural Materials Division. Non-Ferrous Metals Committee (Funder/Sponsor)
Source

Journal of electronic materials. 1997, Vol 26, Num 7, pp 873-877 ; ref : 13 ref

CODEN
JECMA5
ISSN
0361-5235
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Institute of Electrical and Electronics Engineers, New York, NY
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Calcium Fluorure Composé II-VI Composé binaire Composé ternaire Densité dislocation Détecteur infrarouge Etain Séléniure Etude expérimentale Photodiode Plomb Séléniure Propriété matériau Silicium Ca F CaF2 Pb Se Sn Pb1-xSnxSe
Keyword (en)
Calcium Fluorides II-VI compound Binary compound Ternary compound Dislocation density Infrared detector Tin Selenides Experimental study Photodiode Lead Selenides Properties of materials Silicon
Keyword (es)
Calcio Fluoruro Compuesto II-VI Compuesto binario Compuesto ternario Densidad dislocación Detector rayos infrarrojos Estaño Seleniuro Estudio experimental Fotodiodo Plomo Seleniuro Propiedad material Silicio
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F15 Optoelectronic devices

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
2794458

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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