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A new investigation of oxygen flow influence on ITO thin films by magnetron sputtering

Author
AQING CHEN1 2 ; KAIGUI ZHU1 ; HUICAI ZHONG3 ; QINGYI SHAO4 ; GUANGLU GE5
[1] Department of Physics, Beihang University, Beijing 100191, China
[2] School of New Energy Engineering, Leshan Vocational and Technical College, Leshan 614000, China
[3] Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
[4] Laboratory of Quantum Information Technology, School of Physics and Telecommunication Engineering, South China Normal University, Guangzhou 510006, China
[5] Laboratory of Nanostanderization, National Center for Nanoscience and Technology, Beijing 100190, China
Source

Solar energy materials and solar cells. 2014, Vol 120, pp 157-162, 6 p ; a ; ref : 36 ref

ISSN
0927-0248
Scientific domain
General chemistry, physical chemistry; Energy
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
Blue shifts Density functional theory ITO thin films Magnetron sputtering Oxygen vacancy
Keyword (fr)
Absorption optique Addition étain Couche ITO Lacune Limite absorption Méthode fonctionnelle densité Niveau Fermi Oxyde d'indium Oxygène Pulvérisation cathodique Simulation mathématique Spectre photoélectron RX Spectrométrie photoélectron Structure bande Verre ITO
Keyword (en)
Optical absorption Tin addition ITO layers Vacancy Absorption edge Density functional method Fermi level Indium oxide Oxygen Cathodic sputtering Mathematical simulation X-ray photoelectron spectra Photoelectron spectrometry Band structure Glass
Keyword (es)
Absorción óptica Adición estaño Cavidad Límite absorción Nivel Fermi Indio óxido Oxígeno Pulverización catódica Simulación matemática Espectrometría fotoelectrón Estructura banda Vidrio
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D06 Energy / 001D06C Natural energy

Discipline
Energy
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
28045352

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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