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The MBE temperature window for Cd1-xZnxTe (0 ≤ x ≤ 1) compounds grown on 2°-off oriented GaAs(100) substrates : Vapor growth and epitaxy 1996

Author
HERMAN, M. A1 ; KOZHUKHOV, A. V1 ; SADOWSKI, J. T1
[1] Institute of Vacuum Technology, 44/50 Dluga Str., 00241 Warsaw, Poland
Conference title
Vapor growth and epitaxy 1996
Conference name
ICVGE-9 : International Conference on Vapor Growth and Epitaxy (9 ; Vail, Colorado 1996-08-04)
Author (monograph)
STRINGFELLOW, G. B (Editor)1
[1] University of Utah, Utah, United States
Source

Journal of crystal growth. 1997, Vol 174, Num 1-4, pp 768-774 ; ref : 10 ref

CODEN
JCRGAE
ISSN
0022-0248
Scientific domain
Crystallography; Geology; Metallurgy, welding
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Conference Paper
Language
English
Keyword (fr)
Adsorption gaz solide Cadmium tellurure Cinétique Composition chimique Composé ternaire Croissance cristalline en phase vapeur Désorption Effet température Epitaxie jet moléculaire Etude expérimentale Mode opératoire Réaction surface Réactivité Semiconducteur II-VI Solution solide Zinc tellurure Cd Te Zn Cd1-xZnxTe Composé minéral Métal transition composé
Keyword (en)
Gas solid adsorption Cadmium tellurides Kinetics Chemical composition Ternary compounds Crystal growth from vapors Desorption Temperature effects Molecular beam epitaxy Experimental study Operating mode Surface reactions Reactivity II-VI semiconductors Solid solutions Zinc tellurides Inorganic compounds Transition element compounds
Keyword (es)
Adsorción gas sólido Método operatorio
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15H Molecular, atomic, ion, and chemical beam epitaxy

Pacs
8115H Molecular, atomic, ion, and chemical beam epitaxy

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
2822584

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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