Influence of sputtering conditions on the optical and electrical properties of laser-annealed and wet-etched room temperature sputtered ZnO:Al thin films
- Author
- BOUKHICHA, Rym1 ; CHARPENTIER, Coralie1 2 ; PROD'HOMME, Patricia2 ; I CABARROCAS, Pere Roca1 ; LERAT, Jean-François3 ; EMERAUD, Thierry3 ; JOHNSON, Erik1
[1] CNRS, LPICM, Ecole Polytechnique, 91128 Palaiseau, France
[2] Total S&M — New Energies Division, R&D Division, Department of Solar Energies EN/BO/RD/SOL, Tour Michelet. 24 cours Michelet, La Defense 10, 92069 Paris La Defense, France
[3] Photovoltaic Business Unit, Excico Group NV, Kempische Steenweg 305/2, 3500 Hasselt, Belgium - Conference title
- International Symposia on Transparent Conductive Materials, October 2012
- Conference name
- TCM2012 International Symposia on Transparent Conductive Materials (Hersonissos, Crete 2012-10-25)
- Author (monograph)
- KIRIAKIDIS, George (Editor)1
[1] Physics Dpt. Univ. of Crete, Voutes, Heraklion, Crete 70013, Greece - Source
Thin solid films. 2014, Vol 555, pp 13-17, 5 p ; ref : 11 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Author keyword
- Chemical texturing Laser annealing Light-scattering Transparent conductive oxide
- Keyword (fr)
- Addition zinc Attaque chimique Basse pression Cellule solaire Condition opératoire Couche mince Diffusion lumière Dépôt physique phase vapeur Dépôt pulvérisation Effet pression Facteur transmission Gravure Laser couche mince Laser excimère Propriété optique Propriété électrique Pulvérisation irradiation Recuit Silicium Spectre visible Traitement par laser Traitement surface 6855A 7350 7866 8115C Al2O3 Substrat verre ZnO
- Keyword (en)
- Zinc additions Chemical etching Low pressure Solar cells Operating conditions Thin films Light scattering Physical vapor deposition Sputter deposition Pressure effects Transmittance Etching Thin film laser Excimer lasers Optical properties Electrical properties Sputtering Annealing Silicon Visible spectra Laser assisted processing Surface treatments
- Keyword (es)
- Ataque químico Condición operatoria Factor transmisión Laser capa delgada
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70C Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures / 001B70C50 Electronic transport phenomena in thin films and low-dimensional structures
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70H Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation / 001B70H66 Optical properties of specific thin films
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15A Theory and models of film growth
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering
- Discipline
- Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 28244944
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.tsf.2013.08.014 
https://dx.doi.org/10.1016/j.tsf.2013.08.014
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