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Effect of oxygen partial pressure on the properties of NiO-Ag composite films grown by DC reactive magnetron sputtering

Author
ASHOK KUMAR REDDY, Y1 ; SIVASANKAR REDDY, A2 ; SREEDHARA REDDY, P1
[1] Department of Physics, Sri Venkateswara University, Tirupathi 517502, India
[2] Division of Advanced Materials Engineering, Kongju National University, Budaedong, Cheonan City, Korea, Republic of
Source

Journal of alloys and compounds. 2014, Vol 583, pp 396-403, 8 p ; ref : 29 ref

ISSN
0925-8388
Scientific domain
Inorganic chemistry; Crystallography; Metallurgy, welding; Condensed state physics
Publisher
Elsevier, Kidlington
Publication country
United Kingdom
Document type
Article
Language
English
Author keyword
Electrical resistivity Grain size NiO-Ag composite film Oxygen partial pressure Sputtering
Keyword (fr)
Argent Conductivité électrique Couche mince Diffraction RX Effet Hall Microscopie force atomique Microscopie électronique balayage Oxyde de nickel Pression partielle Pulvérisation réactive Relation fabrication propriété Revêtement composite Spectre absorption Spectre photoélectron RX
Keyword (en)
Silver Electrical conductivity Thin films XRD Hall effect Atomic force microscopy Scanning electron microscopy Nickel oxide Partial pressure Reactive sputtering Fabrication property relation Composite coating Absorption spectra X-ray photoelectron spectra
Keyword (es)
Níquel óxido Relación fabricación propiedad Revestimiento compuesto
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70C Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures / 001B70C61 Electrical properties of specific thin films

Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70H Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation / 001B70H66 Optical properties of specific thin films

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering

Discipline
Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
28259203

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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