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Influence of the target-substrate distance on the growth of YSZ thin films

Author
LAMAS, Jérika S1 ; LEROY, Wouter P1 ; DEPLA, Diederik1
[1] Research group DRAFT, Department of Solid State Sciences, Krijgslaan 281/S1, 9000 Ghent, Belgium
Conference title
Selected Papers from the Society of Vacuum Coaters 56th Annual Technical Conference - SVC TechCon 2013
Conference name
SVC TechCon 2013 Society of Vacuum Coaters Annual Technical Conference (56 ; Providence, Road Island 2013-04-20)
Author (monograph)
WALTON, Scott G (Editor)1 ; STOESSEL, Chris H (Editor)2
Society of Vacuum Coaters, Albuquerque, NM, United States (Organiser of meeting)
[1] Naval Research Laboratory, Washington, DC, United States
[2] Eastman Chemical Company, Palo Alto, CA, United States
Source

Surface & coatings technology. 2014, Vol 241, pp 26-29, 4 p ; ref : 20 ref

CODEN
SCTEEJ
ISSN
0257-8972
Scientific domain
General chemistry, physical chemistry; Metallurgy, welding
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Conference Paper
Language
English
Author keyword
Compositional gradient Grain tilt Model Target-substrate distance YSZ thin films
Keyword (fr)
Couche mince Modélisation Traitement surface Zircone stabilisée
Keyword (en)
Thin films Modelling Surface treatments Stabilized zirconia
Keyword (es)
Zircona estabilizada
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
28263188

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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