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Real-time curvature and optical spectroscopy monitoring of magnetron-sputtered WTi alloy thin films

Author
LE PRIOL, A1 2 ; SIMONOT, L1 ; ABADIAS, G1 ; GUERIN, P1 ; RENAULT, P.-O1 ; LE BOURHIS, E1
[1] Institut P', CNRS-University of Poitiers, SP2MI, Bd Marie et Pierre Curie, BP30179, 86962 Futuroscope-Chasseneuil, France
[2] Sagem Defense Sécurité, 72-74 rue de la Tour Billy, BP72, 95101 Argenteuil, France
Conference title
Proceedings of the 40th International Conference on Metallurgical Coatings and Thin Films, ICMCTF 2013, San Diego, California, April 29 - May 3, 2013
Conference name
ICMCTF 2013 International Conference on Metallurgical Coatings and Thin Films (40 ; San Diego, California 2013-04-29)
Author (monograph)
AOUADI, Samir (Editor)1 ; BROITMAN, Esteban (Editor)2 ; KODAMBAKA, Suneel (Editor)3 ; STÜBER, Michael (Editor)4 ; VEPREK, Stan (Editor)5
American Vacuum Society (AVS), Advanced Surface Engineering Division (ASED), New York, NY, United States (Organiser of meeting)
[1] University of North Texas, Dept. of Materials Science and Engineering, 1155 Union Circle #305310, Denton, TX 76203-5017, United States
[2] Linköping University, Dept. of Physics, Chemistry and Biology IFM, 581 83 Linköping, Sweden
[3] University of California Los Angeles, Dept. of Materials Science, E-V 3121J, 410 Westwood Plaza, Los Angeles, CA 90095, United States
[4] Karlsruhe Institute of Technology (KIT), Inst. for Applied Materials (IAM-AWP), Department of Composites and Thin Films, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany
[5] Technical University Munich, Department of Chemistry, Lichtenbergstrasse 4, 85747 Garching, Germany
Source

Surface & coatings technology. 2013, Vol 237, pp 112-117, 6 p ; ref : 29 ref

CODEN
SCTEEJ
ISSN
0257-8972
Scientific domain
General chemistry, physical chemistry; Metallurgy, welding
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Conference Paper
Language
English
Author keyword
In situ optical spectroscopy In situ wafer curvature Magnetron sputtering Thin film growth WTi alloy
Keyword (fr)
Couche mince Dépôt physique phase vapeur In situ Magnétron Pulvérisation irradiation Traitement surface
Keyword (en)
Thin films Physical vapor deposition In situ Magnetrons Sputtering Surface treatments
Keyword (es)
In situ
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11C Production techniques / 001D11C06 Surface treatment

Discipline
Metals. Metallurgy Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
28263225

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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