Electrochemical fabrication of platinum interconnects for implantable electronic devices
- Autor
- RADISIC, A1 ; MORCOS, B. M1 2 3 ; DE BEECK, M. Op1 ; O'CALLAGHAN, J. M1 ; VAN HOOF, C1
[1] imec, Kapeldreef 75, Leuven, Belgium
[2] KACST-Intel Consortium (CENA), Riyadh, Saudi Arabia
[3] Chemistry Department, Faculty of Science, Alexandria University, Egypt - Titulo de la conferencia
- MAM 2013, March 10-13, Leuven, Belgium
- Nombre de la conferencia
- MAM2013 Materials for Advanced Metallization Workshop (22 ; Leuven 2013-03-10)
- Autor ( monografía)
- WILSON, Christopher J (Editor)1 ; DETAVERNIER, Christophe (Editor)2
Imec, Leuven, Belgium (Organiser of meeting)
University of Ghent, Ghent, Belgium (Organiser of meeting)
[1] Imec, Belgium
[2] University of Ghent, Belgium - Fuente
Microelectronic engineering. 2014, Vol 120, pp 251-256, 6 p ; ref : 13 ref
- CODEN
- MIENEF
- ISSN
- 0167-9317
- Campo Científico
- Electronics
- Editor
- Elsevier, Amsterdam
- País de la publicación
- Netherlands
- Tipo de documento
- Conference Paper
- Idioma
- English
- Palabra clave de autor
- Devices Flexible Implantable Interconnects Plating Platinum
- Palabra clave (fr)
- Circuit intégré Composant électronique Dépôt physique phase vapeur Fabrication microélectronique Imide polymère Interconnexion Loi échelle Matériau revêtu Pastille électronique Placage Platine Propriété chimique Propriété physique Propriété électrochimique Rentabilité Revêtement Structure flexible 8115C 8540H
- Palabra clave (in)
- Integrated circuits Electronic component Physical vapor deposition Microelectronic fabrication Polyimides Interconnections Scaling laws Coated material Wafers Plating Platinum Chemical properties Physical properties Electrochemical properties Profitability Coatings Flexible structures
- Palabra clave (es)
- Componente electrónico Fabricación microeléctrica Material revestido Propiedad electroquímica Rentabilidad
- Palabra clave (de)
- Elektronisches Bauelement Beschichteter Werkstoff Elektrochemische Eigenschaft
- Clasificación
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15K Vapor phase epitaxy; growth from vapor phase
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06A Design. Technologies. Operation analysis. Testing
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11C Production techniques / 001D11C06 Surface treatment
- Disciplina
- Electronics Metals. Metallurgy Physics and materials science
- Procedencia
- Inist-CNRS
- Base de datos
- PASCAL
- Identificador INIST
- 28479180
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.mee.2013.07.004 
https://dx.doi.org/10.1016/j.mee.2013.07.004
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