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Surface modification of cellulosic substrates via atmospheric pressure plasma polymerization of acrylic acid: Structure and properties

Author
GARCIA-TORRES, Jose1 ; SYLLA, Dioulde2 ; MOLINA, Laura1 ; CRESPO, Eulalia1 ; MOTA, Jordi1 ; BAUTISTA, Llorenç1
[1] Advanced Materials group, R&D Department, Leitat Technological Center, c/Innovacio 2, 08225 Terrassa, Barcelona, Spain
[2] Electrodep, Physical Chemistry Department, University of Barcelona, c/Marti i Franques, 1, 08028 Barcelona, Spain
Source

Applied surface science. 2014, Vol 305, pp 292-300, 9 p ; ref : 39 ref

ISSN
0169-4332
Scientific domain
General chemistry, physical chemistry; Crystallography; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
Acrylic acid Atmospheric pressure plasma enhanced Cellulose-based substrates Hydrophilic character Poly(acrylic acid) films chemical vapor deposition
Keyword (fr)
Croissance film Dépôt chimique phase vapeur Polymérisation Traitement surface
Keyword (en)
Film growth CVD Polymerization Surface treatments
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology

Discipline
Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
28506751

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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