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Molecular beam epitaxial growth of GaSb/GaAs quantum dots on Ge substrates

Author
KUNRUGSA, Maetee1 ; KIRAVITTAYA, Suwit2 ; SOPITPAN, Suwat3 ; RATANATHAMMAPHAN, Somchai1 ; PANYAKEOW, Somsak1
[1] The Semiconductor Device Research Laboratory (SDRL), Department of Electrical Engineering, Faculty of Engineering, Chulalongkom University, Phayathai Road, Patumwan, Bangkok 10330, Thailand
[2] Department of Electrical and Computer Engineering, Faculty of Engineering, Naresuan University, Phitsanulok 65000, Thailand
[3] Thai Microelectronics Center (TMEC), National Electronics and Computer Technology Center, Chachoengsao 24000, Thailand
Conference title
Proceedings of 17th International Conference on Crystal Growth and Epitaxy (ICCGE-17)
Conference name
ICCGE-17 International Conference on Crystal Growth and Epitaxy (17 ; Warsaw 2013-08-11)
Author (monograph)
SANGWAL, Keshra (Editor); GILLE, Peter (Editor); MILLER, Wolfram (Editor); TALIK, Ewa (Editor)
Polish Society for Crystal Growth (PTWK), Warsaw, Poland (Organiser of meeting)
Deutsche Gesellschaft fuer Kristallwachstum undKristallzuechtung (DGKK), Germany (Organiser of meeting)
University of Warsaw, Warsaw, Poland (Organiser of meeting)
Polish Academy od Science (PAN), Institute of High Pressure Physics (IWC), Poland (Organiser of meeting)
Polish Academy od Science (PAN), Institute of Physics (IF), Poland (Organiser of meeting)
Institute of Electronic Materials Technology (ITME), Warsaw, Poland (Organiser of meeting)
Source

Journal of crystal growth. 2014, Vol 401, pp 441-444, 4 p ; ref : 16 ref

CODEN
JCRGAE
ISSN
0022-0248
Scientific domain
Crystallography; Geology; Metallurgy, welding
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Conference Paper
Language
English
Author keyword
A1. GaAs anti-phase domain A1. Ge substrates A3. GaSb A3. Quantum dots
Keyword (fr)
Analyse structurale Analyse surface Arséniure d'indium Arséniure de gallium Autoassemblage Composé III-V Epitaxie jet moléculaire Mécanisme croissance Nanomatériau Photoluminescence Point quantique Semiconducteur III-V Semiconducteur polaire Structure cristalline 6166 8107 8107T 8115H Substrat GaAs Substrat germanium
Keyword (en)
Structural analysis Surface analysis Indium arsenides Gallium arsenides Self-assembly III-V compound Molecular beam epitaxy Growth mechanism Nanostructured materials Photoluminescence Quantum dots III-V semiconductors Polar semiconductors Crystal structure
Keyword (es)
Análisis estructural Compuesto III-V Mecanismo crecimiento
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60A Structure of solids and liquids; crystallography / 001B60A66 Structure of specific crystalline solids

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A07 Nanoscale materials and structures: fabrication and characterization / 001B80A07T Quantum dots

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A07 Nanoscale materials and structures: fabrication and characterization / 001B80A07Z Other topics in nanoscale materials and structures

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15H Molecular, atomic, ion, and chemical beam epitaxy

Discipline
Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
28766020

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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