Continuous fine pattern formation by screen-offset printing using a silicone blanket
- Author
- NOMURA, Ken-Ichi1 ; KUSAKA, Yasuyuki1 ; USHIJIMA, Hirobumi1 ; NAGASE, Kazuro2 ; IKEDO, Hiroaki2 ; MITSUI, Ryosuke3 ; TAKAHASHI, Seiya3 ; NAKAJIMA, Shin-Ichiro3 ; IWATA, Shiro4
[1] Flexible Electronics Research Centre, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8565, Japan
[2] Mino Group Co., Ltd, Gujo, Gifu 501-4101, Japan
[3] Japan Aviation Electronics Industry, Ltd, Akishima, Tokyo 196-8555, Japan
[4] Shimane Institute for Industrial Technology, Matsue, Shimane 690-0816, Japan - Source
Journal of micromechanics and microengineering (Print). 2014, Vol 24, Num 9 ; 095021.1-095021.7 ; ref : 23 ref
- ISSN
- 0960-1317
- Scientific domain
- Electronics; Mechanical engineering
- Publisher
- Institute of Physics, Bristol
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Keyword (fr)
- Ebullition Formation motif Masque Mouillage Siloxane(diméthyl) polymère Solvant organique Sérigraphie
- Keyword (en)
- Boiling Patterning Masks Wetting Dimethylsiloxane polymer Organic solvents Screen printing
- Keyword (es)
- Siloxano(dimetil) polímero
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H45 Solid-fluid interfaces / 001B60H45G Wetting
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 28811529
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1088/0960-1317/24/9/095021 
https://dx.doi.org/10.1088/0960-1317/24/9/095021
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