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IR-drying of photoresists: experimental and theoretical consideration of drying kinetics of mono- and multi-layered coatings

Author
SCHÖNFELD, M1 ; SCHUBERT, S1 ; SAUPE, J1 ; GRIMM, J1
[1] Department of MEMS, University of Applied Sciences Zwickau (UASZ), 08056 Zwickau, Germany
Conference title
The 10th International Workshop on High Aspect Ration Micro and Nanosystem Technologies (HARMNST), Berlin, April 21-24, 2013
Conference name
HARMNST 2013 International Workshop on High Aspect Ration Micro and Nanosystem Technologies (Berlin 2013-04-22)
Author (monograph)
Micro resist technology GmbH, Berlin, Germany (Organiser of meeting)
Source

Microsystem technologies. 2014, Vol 20, Num 10-11, pp 1803-1806, 4 p ; ref : 1/4 p

ISSN
0946-7076
Scientific domain
Electronics; Mechanical engineering; Metrology and instrumentation
Publisher
Springer, Heidelberg
Publication country
Germany
Document type
Conference Paper
Language
English
Keyword (fr)
Cinétique Coefficient diffusion Loi Fick Modélisation Multicouche Photorésist Revêtement Séchage IR
Keyword (en)
Kinetics Diffusion coefficient Fick laws Modeling Multiple layer Photoresist Coatings Infrared drying
Keyword (es)
Cinética Coeficiente difusión Modelización Capa múltiple Fotorresistencia Revestimiento Secado IR
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D10 Polymer industry, paints, wood / 001D10A Technology of polymers / 001D10A08 Application fields

Discipline
Polymer industry, paints, wood
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
28816314

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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