A Polyurethane-Based Positive Photoresist
- Author
- GARCIA-FERNANDEZ, Luis1 ; SPECHT, Alexandre2 ; DEL CAMPO, Aránzazu1
[1] Max-Planck-Institut für Polymerforschung, Ackermannweg 10, 55128 Mainz, Germany
[2] Laboratoire de Conception et Application de Molecules Bioactives, UMR 7199, CNRS/UDS, Faculte de Pharmacie, 74 Route du Rhin 67400, ILLKIRCH, France - Source
Macromolecular rapid communications. 2014, Vol 35, Num 20, pp 1801-1807, 7 p ; ref : 27 ref
- ISSN
- 1022-1336
- Scientific domain
- Polymers, paint and wood industries
- Publisher
- Wiley, Weinheim
- Publication country
- Germany
- Document type
- Article
- Language
- English
- Author keyword
- photocleavable groups photodegradable polymers photoresists photoresponsive polyurethanes
- Keyword (fr)
- Composé nitro Dérivé du biphényle Etheruréthanne polymère Etude expérimentale Excitation 2 photons Limite résolution Photolithographie Photorésist Polyaddition Polymère réticulé Préparation Résist positif
- Keyword (en)
- Nitro compound Biphenyl derivatives Etherurethane polymer Experimental study Two photon excitation Resolving power Photolithography Photoresist Polyaddition Crosslinked polymer Preparation Positive resist
- Keyword (es)
- Compuesto nitro Bifenilo derivado Eteruretano polímero Estudio experimental Excitación 2 fotones Poder resolución Fotolitografía Fotorresistencia Poliadición Polímero reticulado Preparación Resistencia positiva
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D09 Physicochemistry of polymers / 001D09D Organic polymers / 001D09D02 Preparation, kinetics, thermodynamics, mechanism and catalysts / 001D09D02E Polymers with particular properties
- Discipline
- Physical chemistry of polymers
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 28880513
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1002/marc.201400331 
https://dx.doi.org/10.1002/marc.201400331
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