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Abrasive-Free Chemical Mechanical Polishing of Hard Disk Substrate with Cumene Hydroperoxide-H2O2 Slurry

Author
TING JIANG1 ; HONG LEI1
[1] Research Center of Nano-science and Nano-technology, Shanghai University, Shanghai 200444, China
Source

Journal of electronic materials. 2014, Vol 43, Num 11, pp 4186-4192, 7 p ; ref : 18 ref

CODEN
JECMA5
ISSN
0361-5235
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Springer, Heidelberg
Publication country
Germany
Document type
Article
Language
English
Author keyword
Abrasive-free chemical polishing cumene hydroperoxide (CHP) initiator material removal rate mechanism
Keyword (fr)
Abrasif Boue liquide Disque dur Effet pression Planarisation Polissage chimique Polissage mécanochimique Radical libre Rugosité Résonance paramagnétique éléctronique Spectrométrie Auger Traitement surface Tête lecture Tête magnétique
Keyword (en)
Abrasives Slurries Hard discs Pressure effects Planarization Chemical polishing Chemical mechanical polishing Free radicals Roughness Electron paramagnetic resonance AES Surface treatments Read head Magnetic heads
Keyword (es)
Cabeza lectura
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03C Materials

Discipline
Electronics Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
28883132

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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