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A Facile One-Step Approach to Epitaxially Grow Periodic Arrays of InGaAs/GaAs Nanobars by Metal—Organic Chemical Vapor Deposition: From Site Control to Size Control

Author
BENZHONG WANG1 ; HAN, Ming-Yong1 ; CHUA, Soo-Jin1
[1] Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 3 Research Link, Singapore 117602, Singapore
Source

Crystal growth & design. 2014, Vol 14, Num 12, pp 6550-6556, 7 p ; ref : 40 ref

ISSN
1528-7483
Scientific domain
Crystallography
Publisher
American Chemical Society, Washington,DC
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Arséniure de gallium Autoassemblage Bicouche Commande dimension Composé III-V Couche mince Couche épitaxique Effet dimensionnel Epitaxie Gravure sèche Mécanisme croissance Méthode MOCVD Nanolithographie Nanosphère Nanostructure Optoélectronique intégrée Photolithographie Polymère Réactif attaque Réseau(arrangement) Semiconducteur III-V Silicium 8110A 8115G 8116D 8116N Nanobarre Substrat GaAs Substrat silicium
Keyword (en)
Gallium arsenides Self-assembly Bilayers Size control III-V compound Thin films Epitaxial layers Size effect Epitaxy Dry etching Growth mechanism MOCVD Nanolithography Nanosphere Nanostructures Integrated optoelectronics Photolithography Polymers Etching reagent Arrays III-V semiconductors Silicon Nanobar
Keyword (es)
Compuesto III-V Grabado seco Mecanismo crecimiento Nanosfera Reactivo ataque Nanobarra
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A10 Methods of crystal growth; physics of crystal growth / 001B80A10A Theory and models of crystal growth; physics of crystal growth, crystal morphology and orientation

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A16 Methods of nanofabrication / 001B80A16D Self-assembly

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A16 Methods of nanofabrication / 001B80A16N Nanolithography

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
29034020

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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