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Optical and structural properties of SiOx and SiNx materials

Author
DEHAN, E1 ; TEMPLE-BOYER, P1 ; HENDA, R1 ; PEDROVIEJO, J. J; SCHEID, E1
[1] LAAS-CNRS, 31077 Toulouse, France
Source

Thin solid films. 1995, Vol 266, Num 1, pp 14-19 ; ref : 20 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Elsevier Science, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Keyword (fr)
Composition chimique Couche mince Ellipsométrie Etude expérimentale Indice réfraction Microstructure Méthode CVD Propriété optique Silicium nitrure Silicium oxyde Spectrométrie Fourier Spectrométrie photoélectron
Keyword (en)
Chemical composition Thin films Ellipsometry Experimental study Refractive index Microstructure CVD Optical properties Silicon nitrides Silicon oxides Fourier spectrometry Photoelectron spectroscopy
Keyword (es)
Espectrometría Fourier
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70H Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation / 001B70H66 Optical properties of specific thin films / 001B70H66L Other semiconductors

Pacs
7866L Other semiconductors

Discipline
Physics of condensed state : electronic structure, electrical, magnetic and optical properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
2903723

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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