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Tin-Incorporation Induced Changes in the Microstructural, Optical, and Electrical Behavior of Tungsten Oxide Nanocrystalline Thin Films Grown Via Spray Pyrolysis

Author
MUKHERJEE, Ramnayan1 ; PRAJAPATI, C. S2 ; SAHAY, P. P1
[1] Department of Physics, Motilal Nehru National Institute of Technology, Allahabad 211 004, India
[2] Center for Nano Science and Engineering, Indian Institute of Science, Bangalore 560012, India
Source

Journal of thermal spray technology. 2014, Vol 23, Num 8, pp 1445-1455, 11 p ; ref : 52 ref

ISSN
1059-9630
Scientific domain
Metallurgy, welding
Publisher
Springer, Heidelberg
Publication country
Germany
Document type
Article
Language
English
Author keyword
Sn-doped WO3 thin films electrical properties spray pyrolysis structural and optical properties
Keyword (fr)
Couche mince Couche oxyde Dopage Microstructure Nanocristal Oxydation Oxyde de tungstène Propriété optique Propriété électrique Pyrolyse Traitement surface
Keyword (en)
Thin film Oxide layer Doping Microstructure Nanocrystal Oxidation Tungsten oxide Optical properties Electrical properties Pyrolysis Surface treatment
Keyword (es)
Capa fina Capa óxido Doping Microestructura Nanocristal Oxidación Wolframio óxido Propiedad óptica Propiedad eléctrica Pirólisis Tratamiento superficie
Keyword (de)
Duennschicht Oxidschicht Dopen Mikrogefuege Oxidation Wolframoxid Optische Eigenschaft Elektrische Eigenschaft Pyrolyse Oberflaechenbehandlung
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11C Production techniques / 001D11C06 Surface treatment

Discipline
Metals. Metallurgy Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
29042097

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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