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Preparation of polyvinylcarbazole thin films with vapor deposition polymerization

Author
TAMADA, M1 ; OMICHI, H1 ; OKUI, N
[1] Japan atomic energy res. inst., Takasaki radiation chemistry res. establishment, Takasaki, Gunma 370-12, Japan
Source

Thin solid films. 1995, Vol 268, Num 1-2, pp 18-21 ; ref : 11 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Elsevier Science, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Keyword (fr)
Couche mince Dépôt phase vapeur Dépôt physique phase vapeur Effet température Epaisseur Etude expérimentale Polymère Procédé dépôt Spectrométrie Fourier
Keyword (en)
Thin films Vapor deposition Physical vapor deposition Temperature effects Thickness Experimental study Polymers Deposition process Fourier spectrometry
Keyword (es)
Depósito fase vapor Procedimiento revestimiento Espectrometría Fourier
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering

Pacs
8115C Deposition by sputtering

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
2936169

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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