Preparation and characterization of PbTiO3 thin films by metalorganic chemical vapor deposition on a La0.5Sr0.5CoO3 metallic oxide electrode
- Author
- YAN-FENG CHEN; LI SUN; TAO YU; JIAN-XIE CHEN; YONG-YUAN ZHU; NAI-BEN MING; XIAO-YUAN CHEN; ZHI-GUO LIU
Najing univ., lab. solid-state microstructures and cent. advanced studied sci. technology microstructures, Nanjing 210008, China - Source
Thin solid films. 1995, Vol 269, Num 1-2, pp 18-20 ; ref : 14 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Article
- Language
- English
- Keyword (fr)
- Couche mince Couche épitaxique Epitaxie Etude expérimentale Hétérostructure Méthode CVD Piézoélectricité Plomb titanate Transducteur XRD
- Keyword (en)
- Thin films Epitaxial layers Epitaxy Experimental study Heterostructures CVD Piezoelectricity Lead titanates Transducers XRD
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 2938503
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0040-6090(95)06821-X 
https://dx.doi.org/10.1016/0040-6090(95)06821-X
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