Morphology and stability of (Ti0.9Zr0.1)Si2 thin films on Si(111) and Si(100) formed in UHV
- Author
- DAO, Y; SAYERS, D. E; NEMANICH, R. J
North Carolina State univ., dep. physics, Raleigh NC 27695, United States - Conference title
- International conference on metallurgical coatings and thin films ICMCTF95
- Conference name
- International conference on metallurgical coatings and thin films ICMCTF95 (22 ; San Diego CA 1995-04-24)
- Author (monograph)
- JEHN, Hermann A (Editor)1 ; MATTHEWS, Allan (Editor); MCGUIRE, Gary E (Editor); PETROV, Ivan (Editor)
American Vacuum Society ; vacuum metallurgy and thin films division, New York NY, United States (Funder/Sponsor)
[1] Forschungsinst. Edelmetalle Metallcheme, 73525 Schwaebisch Gmünd, United States - Source
Thin solid films. 1995, Vol 270, Num 1-2, pp 544-548 ; ref : 25 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Composé ternaire Couche mince Etat surface Etude expérimentale Morphologie Recuit Rugosité SEM Spectrométrie Raman Stabilité thermique Titane siliciure Titane Traitement thermique Zirconium siliciure Zirconium
- Keyword (en)
- Ternary compounds Thin films Surface states Experimental study Morphology Annealing Roughness SEM Raman spectroscopy Thermal stability Titanium silicides Titanium Heat treatments Zirconium silicides Zirconium
- Keyword (es)
- Estabilidad térmica
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H60 Physical properties of thin films, nonelectronic / 001B60H60D Thermal stability; thermal effects
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 2958018
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0040-6090(95)06843-0 
https://dx.doi.org/10.1016/0040-6090(95)06843-0
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