In-situ ellipsometric characterization of the electrodeposition of metal films
- Author
- HILFIKER, J. N; THOMPSON, D. W; HALE, J. S; WOOLLAM, J. A
Univ. Nebraska, cent. microelectronic optical materials res., dep. electrical eng., Lincoln NE 68588-0511, United States - Conference title
- International conference on metallurgical coatings and thin films ICMCTF95
- Conference name
- International conference on metallurgical coatings and thin films ICMCTF95 (22 ; San Diego CA 1995-04-24)
- Author (monograph)
- JEHN, Hermann A (Editor)1 ; MATTHEWS, Allan (Editor); MCGUIRE, Gary E (Editor); PETROV, Ivan (Editor)
American Vacuum Society ; vacuum metallurgy and thin films division, New York NY, United States (Funder/Sponsor)
[1] Forschungsinst. Edelmetalle Metallcheme, 73525 Schwaebisch Gmünd, United States - Source
Thin solid films. 1995, Vol 270, Num 1-2, pp 73-77 ; ref : 9 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Caractérisation Condition opératoire Constante optique Couche mince Electrodépôt Ellipsométrie Etude expérimentale Métal Nickel Procédé dépôt Propriété optique Taux croissance
- Keyword (en)
- Characterization Operating conditions Optical constants Thin films Electrodeposition Ellipsometry Experimental study Metals Nickel Deposition process Optical properties Growth rate
- Keyword (es)
- Caracterización Condición operatoria Procedimiento revestimiento
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15P Electrodeposition, electroplating
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 2958085
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0040-6090(95)06851-1 
https://dx.doi.org/10.1016/0040-6090(95)06851-1
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