The SCattering with Angular Limitation in Projection Electron-beam Lithography (SCALPEL) system
- Author
- LIDDLE, J. A; BERGER, S. D; CUSTY, J; FARROW, R. C; FELKER, J. A; FETTER, L. A; FREEMAN, B; HARRIOTT, L. R; HOPKINS, L.L; HUGGINS, H. A; KNUREK, C. S; KRAUS, J. S; BIDDICK, C. J; MIXON, D. A; MKRTCHYAN, M. M; NOVEMBRE, A. E; PEABODY, M. L; SIMPSON, W. M; TARASCON, R. G; WADE, H. H; WASKIEWICZ, W. K; WATSON, G. P; WILLIAMS, J. K; BLAKEY, M. I; WINDT, D. L; BOLAN; BOWLER, S. W; BRADY, K; CAMARDA, R. M; CONNELLY, W. F; CHORKEN, A
AT&T Bell Laboratories, Murray Hill NJ 07974, United States - Conference title
- MicroProcess
- Conference name
- MPC'95. International conference (8 ; Sendai 1995-07-17)
- Author (monograph)
- AOYAGI, Katsunobu (Editor); ATODA, Nobufumi (Editor)1 ; NAKAMURA, Moritaka (Editor); OKAZAKI, Shinji (Editor); SUZUKI, Katsumi (Editor); TAKIGAWA, Tadahiro (Editor); YAMAOKA, Tsuguo (Editor); HARADA, Katsuhiro (Editor); HORIIKE, Yasuhiro (Editor); ITOH, Junji (Editor); KANAYAMA, Toshihiko (Editor); MATSUI, Shinji (Editor); MIYOSHI, Motosuke (Editor); MORIMOTO, Hiroaki (Editor); MUROTA, Junichi (Editor)
Japan Society of Applied Physics, Tokyo, Japan (Funder/Sponsor)
American Vacuum Society, New York NY, United States (Funder/Sponsor)
IEEE ; Electron Device Group, United States (Funder/Sponsor)
[1] SORTEC Corp., Tsukuba-shi, Ibaraki 300-42, Japan - Source
Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6663-6671 ; 1 ; ref : 35 ref
- CODEN
- JJAPA5
- ISSN
- 0021-4922
- Scientific domain
- Crystallography; Optics; Condensed state physics; Physics; Plasma physics
- Publisher
- Japanese journal of applied physics, Tokyo
- Publication country
- Japan
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Etude expérimentale Fabrication microélectronique Lithographie faisceau électron Méthode projection SCALPEL
- Keyword (en)
- Experimental study Microelectronic fabrication Electron beam lithography Projection method
- Keyword (es)
- Estudio experimental Fabricación microeléctrica Litografía haz electrón Método proyección
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 2985618
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1143/JJAP.34.6663 
https://dx.doi.org/10.1143/JJAP.34.6663
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