Plasma-enhanced chemical vapor deposition of organosilicon materials : A comparison of hexamethyldisilane and tetramethylsilane precursors
- Author
- FONSECA, J. L. C1 ; TASKER, S1 ; APPERLEY, D. C1 ; BADYAL, J. P. S1
[1] Department of Chemistry, Science Laboratories, University of Durham, Durham DH1 3LE, United Kingdom - Source
Macromolecules. 1996, Vol 29, Num 5, pp 1705-1710
- CODEN
- MAMOBX
- ISSN
- 0024-9297
- Scientific domain
- Polymers, paint and wood industries
- Publisher
- American Chemical Society, Washington, DC
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Disilane Dépôt chimique phase vapeur modifié Dépôt plasma Etude comparative Etude expérimentale Mécanisme réaction Polymère réticulé Polymérisation décharge électrique Silane organique Silane polymère Structure moléculaire Disilane(hexaméthyl) polymère Silane(tétraméthyl) polymère
- Keyword (en)
- Disilane Modified chemical vapor deposition Plasma deposition Comparative study Experimental study Reaction mechanism Crosslinked polymer Glow discharge polymerization Organic silane Polysilane Molecular structure
- Keyword (es)
- Disilano Depósito químico fase vapor modificado Depósito plasma Estudio comparativo Estudio experimental Mecanismo reacción Polímero reticulado Polimerización descarga eléctrica Silano orgánico Silano polímero Estructura molecular
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D09 Physicochemistry of polymers / 001D09B Polymers and radiations / 001D09B01 Polymerization
- Discipline
- Physical chemistry of polymers
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3005351
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1021/ma950222v 
https://dx.doi.org/10.1021/ma950222v
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