A spatially-averaged model for high density discharges
- Author
- MEYYAPPAN, M1 ; GOVINDAN, T. R1
[1] Scientific Research Associates Inc, PO Box 1058, Glastonbury CT 06033, United States - Source
Vacuum. 1996, Vol 47, Num 3, pp 215-220 ; ref : 18 ref
- CODEN
- VACUAV
- ISSN
- 0042-207X
- Scientific domain
- Metallurgy, welding; Physics
- Publisher
- Elsevier, Oxford
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Keyword (fr)
- Chlore molécule Plasma couplé inductivement Réacteur traitement matériau Résonance cyclotronique électronique Simulation ordinateur Source plasma Vide moyen
- Keyword (en)
- Chlorine molecules Inductively coupled plasma Materials processing reactors Electron cyclotron-resonance Computerized simulation Plasma sources Medium vacuum
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B50 Plasma production and heating / 001B50B50D Plasma sources
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B77 Plasma applications
- Pacs
- 5250D Plasma sources
- Discipline
- Physics of gases, plasmas and electric discharges
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3008529
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0042-207X(95)00231-6 
https://dx.doi.org/10.1016/0042-207X(95)00231-6
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