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Reduction of CD variance by using optical proximity correction for patterning with DUV phase shift mask

Author
ZHANG, H1
[1] SEMATCH, 27063 Montopolis Drive, Austin, TX 78741, United States
Conference title
Micro- and nano- engineering 95
Conference name
MNE'95 : international conference on micro- and nanofabrication (Aix-en-Provence 1995-09-25)
Author (monograph)
PERROCHEAU, J (Editor)1
[1] ELISA, Les Ullis, France
Source

Microelectronic engineering. 1996, Vol 30, Num 1-4, pp 119-122 ; ref : 2 ref

CODEN
MIENEF
ISSN
0167-9317
Scientific domain
Electronics
Publisher
Elsevier Science, Amsterdam
Publication country
Netherlands
Document type
Conference Paper
Language
English
Keyword (fr)
Correction Déphasage Effet proximité Etude théorique Fabrication microélectronique Lithographie Masque Temps calcul
Keyword (en)
Corrections Phase shift Proximity effect Theoretical study Microelectronic fabrication Lithography Mask Computation time
Keyword (es)
Corrección Defasaje Efecto proximidad Estudio teórico Fabricación microeléctrica Litografía Máscara Tiempo computación
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
3018757

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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