Preferential sputtering and surface binding energy in metal silicides
- Author
- ZAPOROZCHENKO, V. I1 ; STEPANOVA, M. G; VOJTUSIK, S. S1
[1] Research Center for Surface and Vacuum Investigations, Kazarmenny per.6 korp.1, 109028 Moscow, Russian Federation - Source
Vacuum. 1996, Vol 47, Num 5, pp 421-424 ; ref : 25 ref
- CODEN
- VACUAV
- ISSN
- 0042-207X
- Scientific domain
- Metallurgy, welding; Physics
- Publisher
- Elsevier, Oxford
- Publication country
- United Kingdom
- Document type
- Article
- Language
- Russian
- Keyword (fr)
- Chrome siliciure Composé binaire Composé minéral Effet physique rayonnement Energie liaison Etude expérimentale Faisceau ion Fer siliciure Molybdène siliciure Niobium siliciure Pulvérisation irradiation Spectrométrie Auger Tantale siliciure Tungstène siliciure Vanadium siliciure Métal transition composé
- Keyword (en)
- Chromium silicides Binary compounds Inorganic compounds Physical radiation effects Binding energy Experimental study Ion beams Iron silicides Molybdenum silicides Niobium silicides Sputtering AES Tantalum silicides Tungsten silicides Vanadium silicides Transition element compounds
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70I Electron and ion emission by liquids and solids; impact phenomena / 001B70I20 Impact phenomena (including electron spectra and sputtering) / 001B70I20R Atomic, molecular, and ion beam impact and interactions with surfaces
- Discipline
- Physics of condensed state : electronic structure, electrical, magnetic and optical properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3071785
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0042-207X(96)00002-4 
https://dx.doi.org/10.1016/0042-207X(96)00002-4
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