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Recent advances in island and multilayer growth of metals on metals far from equilibrium

Author
VIDALI, G1 ; ZENG, H1
[1] The Solid State Science and Technology Program, Department of Physics, Syracuse University, Syracuse, NY 13244-1130, United States
Conference title
International Conference on Solid Films and Surfaces, ICSFS-7
Conference name
International Conference on Solid Films and Surfaces, ICSFS-7 (7 ; Hsinchu 1994-12-12)
Author (monograph)
HWANG, H. L (Editor)1 ; TSONG, T. T (Editor)
[1] National Tsing Hua University, Taiwan, Taiwan, Province of China
Source

Applied surface science. 1996, Vol 92, Num 1-4, pp 11-19 ; ref : 34 ref

ISSN
0169-4332
Scientific domain
General chemistry, physical chemistry; Crystallography; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics
Publisher
Elsevier Science, Amsterdam
Publication country
Netherlands
Document type
Conference Paper
Language
English
Keyword (fr)
Article synthèse Croissance cristalline Croissance film Epitaxie jet moléculaire Hétéroépitaxie Interface solide solide Rugosité Structure îlot Pb Substrat Cu
Keyword (en)
Reviews Crystal growth Film growth Molecular beam epitaxy Heteroepitaxy Solid-solid interfaces Roughness Island structure
Keyword (es)
Heteroepitaxia
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15H Molecular, atomic, ion, and chemical beam epitaxy

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy

Pacs
8115H Molecular, atomic, ion, and chemical beam epitaxy

Discipline
Metals. Metallurgy Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
3071812

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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