Pascal and Francis Bibliographic Databases

Help

Export

Selection :

Permanent link
http://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=3093998

Influence of magnetron sputtering process parameters on wear properties of steel/Cr3Si or Cr/MoSx

Author
WEISE, G1 ; TERESIAK, A1 ; BÄCHER, I1 ; MARKSCHLÄGER, P; KAMPSCHULTE, G
[1] Institute for Solid State and Material Research, P.O. Box 270016, 01171 Dresden, Germany
Conference title
ICMCTF95 International Conference on Metallurgical Coatings and Thin Films
Conference name
ICMCTF95 International Conference on Metallurgical Coatings and Thin Films (22 ; San Diego, CA 1995-04-24)
Author (monograph)
JEHN, Hermann A (Editor)1 ; MATTHEWS, Allan (Editor); MCGUIRE, Gary E (Editor); PETROV, Ivan (Editor)
American Vacuum Society ; Vacuum Metallurgy and Thin Films Divisions, New York NY, United States (Funder/Sponsor)
[1] Forschungsinstitut für Edelmetalle und Metallcheme, Katharinenstrasse 17, 73525 Schwaebisch Gmünd, Germany
Source

Surface & coatings technology. 1995, Vol 76-77, Num 1-3, pp 382-392 ; 2 ; ref : 24 ref

CODEN
SCTEEJ
ISSN
0257-8972
Scientific domain
General chemistry, physical chemistry; Metallurgy, welding
Publisher
Elsevier, Lausanne
Publication country
Switzerland
Document type
Conference Paper
Language
English
Keyword (fr)
Caractérisation Chrome siliciure Couche mince Dépôt physique phase vapeur Epaisseur Etude expérimentale Magnétron Molybdène sulfure Propriété mécanique Pulvérisation irradiation Résistance usure Traitement surface Tribologie Usure
Keyword (en)
Characterization Chromium silicides Thin films Physical vapor deposition Thickness Experimental study Magnetrons Molybdenum sulfides Mechanical properties Sputtering Wear resistance Surface treatments Tribology Wear
Keyword (es)
Caracterización
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering

Pacs
8115C Deposition by sputtering

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
3093998

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

Access to the document

Searching the Web