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Inorganic coatings on polymers

Author
BENMALEK, M1 ; DUNLOP, H. M1
[1] Pechiney CRV, BP 27, 38340 Voreppe, France
Conference title
ICMCTF95 International Conference on Metallurgical Coatings and Thin Films
Conference name
ICMCTF95 International Conference on Metallurgical Coatings and Thin Films (22 ; San Diego, CA 1995-04-24)
Author (monograph)
JEHN, Hermann A (Editor)1 ; MATTHEWS, Allan (Editor); MCGUIRE, Gary E (Editor); PETROV, Ivan (Editor)
American Vacuum Society ; Vacuum Metallurgy and Thin Films Divisions, New York NY, United States (Funder/Sponsor)
[1] Forschungsinstitut für Edelmetalle und Metallcheme, Katharinenstrasse 17, 73525 Schwaebisch Gmünd, Germany
Source

Surface & coatings technology. 1995, Vol 76-77, Num 1-3, pp 821-826 ; 2 ; ref : 18 ref

CODEN
SCTEEJ
ISSN
0257-8972
Scientific domain
General chemistry, physical chemistry; Metallurgy, welding
Publisher
Elsevier, Lausanne
Publication country
Switzerland
Document type
Conference Paper
Language
English
Keyword (fr)
Aluminium oxyde Couche mince Dépôt plasma Dépôt sous vide Etude expérimentale Microscopie force atomique Polymère Revêtement Silicium oxyde TEM
Keyword (en)
Aluminium oxides Thin films Plasma deposition Vacuum deposition Experimental study Atomic force microscopy Polymers Coatings Silicon oxides TEM
Keyword (es)
Depósito plasma Depósito bajo vacío
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy

Pacs
8115 Methods of deposition of films and coatings; film growth and epitaxy

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
3094047

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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