Dry-etching mechanism of sputtered Pb(Zr1-xTix)O3 film
- Author
- IKEGAMI, N1 ; MATSUI, T1 ; KANAMORI, J1
[1] VLSI R&D Center, Electronic Devices Group, Oki Electric Industry Co., Ltd., 550-1 Higashiasakawa, Hachioji, Tokyo 193, Japan - Conference title
- Dry process
- Conference name
- Dry Process Symposium (DPS '95) (DPS '95) (17 ; Tokyo 1995-11-01)
- Author (monograph)
- HORIIKE, Yasuhiro (Editor)1 ; HIROSE, Masataka (Editor); SUDO, Ken (Editor); KUROGI, Yukinori (Editor); SUGAI, Hideo (Editor); FUYUKI, Takashi (Editor); MAEDA, Masahiko (Editor)
Institute of Electrical Engineers of Japan, Tokyo, Japan (Funder/Sponsor)
Japan Society of Applied Physics, Tokyo, Japan (Funder/Sponsor)
Institute of Electronics, Information and Communication Engineers, Japan (Funder/Sponsor)
Electrochemical Society ; Japan Chapter, Japan (Funder/Sponsor)
[1] Department of Electrical Engineering, Tokyo University, 2100 Nakanodai, Kujirai, Kawagoe 350, Japan - Source
Japanese journal of applied physics. 1996, Vol 35, Num 4B, pp 2505-2511 ; 1 ; ref : 12 ref
- CODEN
- JJAPA5
- ISSN
- 0021-4922
- Scientific domain
- Crystallography; Optics; Condensed state physics; Physics; Plasma physics
- Publisher
- Japanese journal of applied physics, Tokyo
- Publication country
- Japan
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Attaque chimique Composition chimique Composé quaternaire Couche mince Effet physique rayonnement Etude expérimentale In situ Matériau ferroélectrique PZT Plasma Plomb titanate Plomb zirconate Procédé voie sèche Pulvérisation irradiation RBS Rayon X Solution solide Spectrométrie photoélectron Traitement surface O Pb Ti Zr Pb(Zr1-xTix)O3 Composé minéral
- Keyword (en)
- Chemical etching Chemical composition Quaternary compounds Thin films Physical radiation effects Experimental study In situ Ferroelectric materials PZT Plasma Lead titanates Lead zirconates Dry process Sputtering RBS X radiation Solid solutions Photoelectron spectroscopy Surface treatments Inorganic compounds
- Keyword (es)
- Ataque químico In situ Procedimiento vía seca
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments
- Discipline
- Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3102657
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1143/JJAP.35.2505 
https://dx.doi.org/10.1143/JJAP.35.2505
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