Preparation of TiN film on bras by CAPD as a decoration system
- Author
- WANG, S.-G1 ; BAI, X.-D1 ; WANG, B.-C1 ; FAN, Y.-D1
[1] Department of Material Science and Engineering, Tsinghua University, Beijing 100084, China - Source
Thin solid films. 1996, Vol 278, Num 1-2, pp 67-73 ; ref : 20 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Article
- Language
- English
- Keyword (fr)
- Analyse image Couche mince Dépôt plasma Epaisseur Etude expérimentale Métallographie Méthode électrochimique Pression partielle Procédé dépôt Propriété optique Revêtement décoratif Réflectivité Résistance corrosion SEM Spectrométrie Auger TEM Titane nitrure Traitement surface
- Keyword (en)
- Image analysis Thin films Plasma deposition Thickness Experimental study Metallography Electrochemical method Partial pressure Deposition process Optical properties Decorative coatings Reflectivity Corrosion resistance SEM AES TEM Titanium nitrides Surface treatments
- Keyword (es)
- Depósito plasma Método electroquímico Procedimiento revestimiento Revestimiento decorativo Reflectividad
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H60 Physical properties of thin films, nonelectronic / 001B60H60W Other nonelectronic physical properties
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3142531
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/0040-6090(95)08179-8 
https://dx.doi.org/10.1016/0040-6090(95)08179-8
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