Low temperature limits of diamond film growth by microwave plasma-assisted CVD
- Author
- STIEGLER, J1 ; LANG, T1 ; NYGARD-FERGUSON, M1 ; VON KAENEL, Y1 ; BLANK, E1
[1] Laboratoire de Métallurgie Physique, Ecole Polytechnique Fédérale de Lausanne, 1015 Lausanne, Switzerland - Conference title
- Diamond Films '95: European Conference on Diamond, Diamond-like and Related Materials
- Conference name
- Diamond Films '95: European Conference on Diamond, Diamond-like and Related Materials (6 ; Barcelona 1995-09-10)
- Author (monograph)
- BACHMANN, Peter K (Editor)1 ; BUCKLEY-GOLDER, Ian M (Editor); GLASS, Jeffrey T (Editor); KAMO, Matzukazu (Editor)
[1] Philips Research Laboratories, Germany - Source
Diamond and related materials. 1996, Vol 5, Num 3-5, pp 226-230 ; ref : 21 ref
- ISSN
- 0925-9635
- Scientific domain
- Crystallography
- Publisher
- Elsevier, Amsterdam
- Publication country
- Netherlands
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Basse température Couche mince Croissance cristalline en phase vapeur Diamant Etude expérimentale Hyperfréquence Microstructure Morphologie Méthode PECVD Non métal Substrat Surface C
- Keyword (en)
- Low temperature Thin films Crystal growth from vapors Diamonds Experimental study Microwave radiation Microstructure Morphology PECVD Nonmetals Substrates Surfaces
- Keyword (es)
- Baja temperatura
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3151384
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Access to the document
Install on your browser
DOI
10.1016/0925-9635(95)00349-5 
https://dx.doi.org/10.1016/0925-9635(95)00349-5
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:28:\"10.1016\/0925-9635(95)00349-5\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:78:\"Low temperature limits of diamond film growth by microwave plasma-assisted CVD\";s:9:\"\u0000*\u0000jtitle\";s:29:\"Diamond and related materials\";s:9:\"\u0000*\u0000stitle\";s:18:\"Diam. relat. mater\";s:7:\"\u0000*\u0000date\";s:4:\"1996\";s:9:\"\u0000*\u0000volume\";s:1:\"5\";s:8:\"\u0000*\u0000issue\";s:3:\"3-5\";s:8:\"\u0000*\u0000spage\";s:3:\"226\";s:8:\"\u0000*\u0000epage\";s:3:\"230\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0925-9635\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"STIEGLER\";s:10:\"\u0000*\u0000aufirst\";s:1:\"J\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:4:{i:0;s:7:\"LANG, T\";i:1;s:18:\"NYGARD-FERGUSON, M\";i:2;s:13:\"VON KAENEL, Y\";i:3;s:8:\"BLANK, E\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:85:\"Diamond Films '95: European Conference on Diamond, Diamond-like and Related Materials\";s:8:\"\u0000*\u0000title\";s:78:\"Low temperature limits of diamond film growth by microwave plasma-assisted CVD\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Panist access
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:28:\"10.1016\/0925-9635(95)00349-5\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:78:\"Low temperature limits of diamond film growth by microwave plasma-assisted CVD\";s:9:\"\u0000*\u0000jtitle\";s:29:\"Diamond and related materials\";s:9:\"\u0000*\u0000stitle\";s:18:\"Diam. relat. mater\";s:7:\"\u0000*\u0000date\";s:4:\"1996\";s:9:\"\u0000*\u0000volume\";s:1:\"5\";s:8:\"\u0000*\u0000issue\";s:3:\"3-5\";s:8:\"\u0000*\u0000spage\";s:3:\"226\";s:8:\"\u0000*\u0000epage\";s:3:\"230\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0925-9635\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"STIEGLER\";s:10:\"\u0000*\u0000aufirst\";s:1:\"J\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:4:{i:0;s:7:\"LANG, T\";i:1;s:18:\"NYGARD-FERGUSON, M\";i:2;s:13:\"VON KAENEL, Y\";i:3;s:8:\"BLANK, E\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:85:\"Diamond Films '95: European Conference on Diamond, Diamond-like and Related Materials\";s:8:\"\u0000*\u0000title\";s:78:\"Low temperature limits of diamond film growth by microwave plasma-assisted CVD\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Istex access
"O:16:\"UnpaywallOpenUrl\":35:{s:8:\"\u0000*\u0000email\";s:27:\"assistance-portail@inist.fr\";s:6:\"\u0000*\u0000fmt\";N;s:6:\"\u0000*\u0000doi\";s:28:\"10.1016\/0925-9635(95)00349-5\";s:6:\"\u0000*\u0000pii\";N;s:7:\"\u0000*\u0000pmid\";N;s:9:\"\u0000*\u0000atitle\";N;s:9:\"\u0000*\u0000jtitle\";N;s:9:\"\u0000*\u0000stitle\";N;s:7:\"\u0000*\u0000date\";N;s:9:\"\u0000*\u0000volume\";N;s:8:\"\u0000*\u0000issue\";N;s:8:\"\u0000*\u0000spage\";N;s:8:\"\u0000*\u0000epage\";N;s:8:\"\u0000*\u0000pages\";N;s:7:\"\u0000*\u0000issn\";N;s:8:\"\u0000*\u0000eissn\";N;s:9:\"\u0000*\u0000aulast\";N;s:10:\"\u0000*\u0000aufirst\";N;s:9:\"\u0000*\u0000auinit\";N;s:10:\"\u0000*\u0000auinitm\";N;s:5:\"\u0000*\u0000au\";N;s:9:\"\u0000*\u0000aucorp\";N;s:7:\"\u0000*\u0000isbn\";N;s:8:\"\u0000*\u0000coden\";N;s:8:\"\u0000*\u0000genre\";N;s:7:\"\u0000*\u0000part\";N;s:9:\"\u0000*\u0000btitle\";N;s:8:\"\u0000*\u0000title\";N;s:8:\"\u0000*\u0000place\";N;s:6:\"\u0000*\u0000pub\";N;s:10:\"\u0000*\u0000edition\";N;s:9:\"\u0000*\u0000tpages\";N;s:9:\"\u0000*\u0000series\";N;s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";N;}"
Unpaywall access
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:28:\"10.1016\/0925-9635(95)00349-5\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:78:\"Low temperature limits of diamond film growth by microwave plasma-assisted CVD\";s:9:\"\u0000*\u0000jtitle\";s:29:\"Diamond and related materials\";s:9:\"\u0000*\u0000stitle\";s:18:\"Diam. relat. mater\";s:7:\"\u0000*\u0000date\";s:4:\"1996\";s:9:\"\u0000*\u0000volume\";s:1:\"5\";s:8:\"\u0000*\u0000issue\";s:3:\"3-5\";s:8:\"\u0000*\u0000spage\";s:3:\"226\";s:8:\"\u0000*\u0000epage\";s:3:\"230\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0925-9635\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"STIEGLER\";s:10:\"\u0000*\u0000aufirst\";s:1:\"J\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:4:{i:0;s:7:\"LANG, T\";i:1;s:18:\"NYGARD-FERGUSON, M\";i:2;s:13:\"VON KAENEL, Y\";i:3;s:8:\"BLANK, E\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:85:\"Diamond Films '95: European Conference on Diamond, Diamond-like and Related Materials\";s:8:\"\u0000*\u0000title\";s:78:\"Low temperature limits of diamond film growth by microwave plasma-assisted CVD\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Europe PubMed Central access
"O:11:\"BaseOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:28:\"10.1016\/0925-9635(95)00349-5\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:78:\"Low temperature limits of diamond film growth by microwave plasma-assisted CVD\";s:9:\"\u0000*\u0000jtitle\";s:29:\"Diamond and related materials\";s:9:\"\u0000*\u0000stitle\";s:18:\"Diam. relat. mater\";s:7:\"\u0000*\u0000date\";s:4:\"1996\";s:9:\"\u0000*\u0000volume\";s:1:\"5\";s:8:\"\u0000*\u0000issue\";s:3:\"3-5\";s:8:\"\u0000*\u0000spage\";s:3:\"226\";s:8:\"\u0000*\u0000epage\";s:3:\"230\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0925-9635\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"STIEGLER\";s:10:\"\u0000*\u0000aufirst\";s:1:\"J\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:4:{i:0;s:7:\"LANG, T\";i:1;s:18:\"NYGARD-FERGUSON, M\";i:2;s:13:\"VON KAENEL, Y\";i:3;s:8:\"BLANK, E\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:85:\"Diamond Films '95: European Conference on Diamond, Diamond-like and Related Materials\";s:8:\"\u0000*\u0000title\";s:78:\"Low temperature limits of diamond film growth by microwave plasma-assisted CVD\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Base Search access
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:10:\"proceeding\";s:6:\"\u0000*\u0000doi\";s:28:\"10.1016\/0925-9635(95)00349-5\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:78:\"Low temperature limits of diamond film growth by microwave plasma-assisted CVD\";s:9:\"\u0000*\u0000jtitle\";s:29:\"Diamond and related materials\";s:9:\"\u0000*\u0000stitle\";s:18:\"Diam. relat. mater\";s:7:\"\u0000*\u0000date\";s:4:\"1996\";s:9:\"\u0000*\u0000volume\";s:1:\"5\";s:8:\"\u0000*\u0000issue\";s:3:\"3-5\";s:8:\"\u0000*\u0000spage\";s:3:\"226\";s:8:\"\u0000*\u0000epage\";s:3:\"230\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0925-9635\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"STIEGLER\";s:10:\"\u0000*\u0000aufirst\";s:1:\"J\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:4:{i:0;s:7:\"LANG, T\";i:1;s:18:\"NYGARD-FERGUSON, M\";i:2;s:13:\"VON KAENEL, Y\";i:3;s:8:\"BLANK, E\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:0:\"\";s:8:\"\u0000*\u0000genre\";s:10:\"proceeding\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:85:\"Diamond Films '95: European Conference on Diamond, Diamond-like and Related Materials\";s:8:\"\u0000*\u0000title\";s:78:\"Low temperature limits of diamond film growth by microwave plasma-assisted CVD\";s:8:\"\u0000*\u0000place\";s:9:\"Amsterdam\";s:6:\"\u0000*\u0000pub\";s:8:\"Elsevier\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
arXiv access
