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Laser projection patterning for the formation of thin film diamond microstructures

Author
CHAN, S. S. M1 ; RAYBOULD, F; ARTHUR, G; GOODALL, F; JACKMAN, R. B1
[1] Electronic and Electrical Engineering, University College London, Torrington Place, London, WC1E 7JE, United Kingdom
Conference title
Diamond Films '95: European Conference on Diamond, Diamond-like and Related Materials
Conference name
Diamond Films '95: European Conference on Diamond, Diamond-like and Related Materials (6 ; Barcelona 1995-09-10)
Author (monograph)
BACHMANN, Peter K (Editor)1 ; BUCKLEY-GOLDER, Ian M (Editor); GLASS, Jeffrey T (Editor); KAMO, Matzukazu (Editor)
[1] Philips Research Laboratories, Germany
Source

Diamond and related materials. 1996, Vol 5, Num 3-5, pp 317-320 ; ref : 16 ref

ISSN
0925-9635
Scientific domain
Crystallography
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Conference Paper
Language
English
Keyword (fr)
Atmosphère contrôlée Caractérisation Couche épaisse Diamant Etude expérimentale Formation motif Gravure Masquage Minéral synthétique Méthode ablation laser Non métal Polycristal Spectre Raman C
Keyword (en)
Controlled atmospheres Characterization Thick film Diamonds Experimental study Patterning Etching Masking Synthetic mineral Laser ablation technique Nonmetals Polycrystals Raman spectra
Keyword (es)
Caracterización Capa espesa Formacíon motivo Mineral sintético
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments

Pacs
8165C Surface cleaning, etching, patterning

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
3151392

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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