Molecular dynamics simulation of the thin film fabrication process

Author

KATO, S¹ ; HU, H¹
[1] Energy System Design Laboratory, Department of Mechanical Engineering, Faculty of Engineering, Mie University, Tsu, Mie 514, Japan

Conference title

IVC-13/ICSS-9

Conference name

ICSS-9: International Conference on Solid Surfaces (9 ; Yokohama 1995-09-25) = IVC-13: International Vacuum Congress (13 ; Yokohama 1995-09-25)

Author (monograph)

KAWAJI, S (Editor); KLEYN, A. W (Editor)¹ ; MURATA, Y (Editor); WANDELT, K (Editor); YOSHIMORI, A (Author of introductory parts); HIRAKI, A (Author of introductory parts); KOBAYASHI, M (Author of introductory parts)
International Union of Vacuum Science Technique and Application IUVSTA, International (Funder/Sponsor)
[1] FOM-Institute for Atomic and Molecular Physics, Kuislaan 407, 1098 SJ Amsterdam, Netherlands

Source

Surface science. 1996, Vol 357-58, pp 891-895 ; ref : 6 ref

CODEN

SUSCAS

ISSN

0039-6028

Scientific domain

General chemistry, physical chemistry; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics; Polymers, paint and wood industries

Publisher

Elsevier Science, Amsterdam / Elsevier Science, Lausanne / Elsevier Science, New York, NY

Publication country

Netherlands

Document type

Conference Paper

Language

English

Keyword (fr)

Calcul dynamique moléculaire Couche mince Cristallisation Etude théorique Interface solide fluide Matériau semiconducteur Méthode CVD Silicium Simulation numérique Si

Keyword (en)

Molecular dynamics calculations Thin films Crystallization Theoretical study Solid-fluid interfaces Semiconductor materials CVD Silicon Numerical simulation

Keyword (es)

Simulación numérica

Classification

Pascal

001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H45 Solid-fluid interfaces

Pascal

001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Pacs

8115G Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.)

Discipline

Physics and materials science Physics of condensed state : structure, mechanical and thermal properties

Origin

Inist-CNRS

Database

PASCAL

INIST identifier

3167084

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS