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Plasma source ion implantation of nitrogen, carbon and oxygen into Ti-6Al-4V alloy

Author
HAN, S1 ; KIM, H; LEE, Y1 ; LEE, J1 ; KIM, S.-G1
[1] Advanced Analysis Center, Korea Institute of Science and Technology, PO Box 131, Cheongryang, Seoul 130-650, Korea, Republic of
Source

Surface & coatings technology. 1996, Vol 82, Num 3, pp 270-276 ; ref : 20 ref

CODEN
SCTEEJ
ISSN
0257-8972
Scientific domain
General chemistry, physical chemistry; Metallurgy, welding
Publisher
Elsevier, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Keyword (fr)
Alliage base titane Aluminium alliage Application Azote ion Carbone ion Distribution concentration Dureté Implantation ion Orthopédie Oxygène ion Plasma Procédé fabrication Profil profondeur Traitement surface Vanadium alliage Al Ti V Alliage TA6V Alliage Ti90Al6V4
Keyword (en)
Titanium base alloys Aluminium alloy Application Nitrogen ion Carbon ion Concentration distribution Hardness Ion implantation Orthopedics Oxygen ion Plasma Manufacturing process Depth profile Surface treatment Vanadium alloy
Keyword (es)
Aluminio aleación Aplicación Nitrógeno ión Carbono ión Distribución concentración Dureza Implantación ión Ortopedia Oxígeno ion Plasma Procedimiento fabricación Perfil profundidad Tratamiento superficie Vanadio aleación
Keyword (de)
Aluminiumlegierung Anwendung Stickstoffion Kohlenstoffion Konzentrationsverteilung Haerte Ionenimplantation Sauerstoffion Plasma Fertigungsverfahren Tiefenprofil Oberflaechenbehandlung Vanadiumlegierung
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11C Production techniques / 001D11C06 Surface treatment / 001D11C06F Other surface treatments

Discipline
Metals. Metallurgy
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
3169774

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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