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Power spectral density analysis of strain-induced InP islands on GaInP/GaAs(100)

Author
HSUEH, G. C1 2 ; REAVES, C. M3 ; DENBAARS, S. P3 ; WEINBERG, W. H2
[1] Center for Quantized Electonic Structures, University of California, Santa Barbara, CA 93106, United States
[2] Department of Chemical Engineering, University of California 93106, Santa Barbara, CA 93106, United States
[3] Materials Department, University of California, Santa Barbara, CA 93106, United States
Source

Surface science. 1996, Vol 366, Num 1, pp 129-139 ; ref : 32 ref

CODEN
SUSCAS
ISSN
0039-6028
Scientific domain
General chemistry, physical chemistry; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics; Polymers, paint and wood industries
Publisher
Elsevier Science, Amsterdam / Elsevier Science, Lausanne / Elsevier Science, New York, NY
Publication country
Netherlands
Document type
Article
Language
English
Keyword (fr)
Composé minéral Etude expérimentale Indium phosphure Matériau semiconducteur Microscopie force atomique Mécanisme croissance Méthode MOCVD Structure îlot In P InP
Keyword (en)
Inorganic compounds Experimental study Indium phosphides Semiconductor materials Atomic force microscopy Growth mechanism MOCVD Island structure
Keyword (es)
Mecanismo crecimiento
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Pacs
8115G Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.)

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
3212646

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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