Adhesion improvement of photoresist on TiN/Al multilayer by ozone treatment
- Author
- WAKAMIYA, W1 ; HIRAYAMA, M1 ; YASUOKA, A1 ; KAWAI, A2
[1] ULSI Laboratory, Mitsubishi Electric Corporation, 4-1 Mizuhara, Itami, Hyogo 664, Japan
[2] Department of Electrical Engineering, Nagaoka University of Technology, 1603-1 Kamitomioka, Nagaoka, Niigata 940-21, Japan - Source
Japanese journal of applied physics. 1996, Vol 35, Num 9B, pp L1227-L1229 ; 2 ; ref : 9 ref
- CODEN
- JJAPA5
- ISSN
- 0021-4922
- Scientific domain
- Crystallography; Optics; Condensed state physics; Physics; Plasma physics
- Publisher
- Japanese journal of applied physics, Tokyo
- Publication country
- Japan
- Document type
- Article
- Language
- English
- Keyword (fr)
- Adhérence Aluminium Composé binaire Essai arrachement Etude expérimentale Fabrication microélectronique Force adhérence Multicouche Ozone Photorésist Titane Nitrure N Ti TiN
- Keyword (en)
- Adhesion Aluminium Binary compound Peeling test Experimental study Microelectronic fabrication Adhesive strength Multiple layer Ozone Photoresist Titanium Nitrides
- Keyword (es)
- Adherencia Aluminio Compuesto binario Prueba desgarradura Estudio experimental Fabricación microeléctrica Fuerza adherencia Capa múltiple Ozono Fotorresistente Titanio Nitruro
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3259505
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1143/JJAP.35.L1227 
https://dx.doi.org/10.1143/JJAP.35.L1227
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