Predominant influences on the bulk properties and surface morphology in hydrogenated amorphous silicon carbide films
- Author
- ISHIZUKA, Y1 ; YAMAGUCHI, T; IIDA, Y; NOZAKI, H; FURUKAWA, A
[1] Materials and Devices Research Laboratories, Toshiba Corporation, 33 Shin-Isogo-cho, Isogo-ku, Yokohama 235, Japan - Source
Philosophical magazine. B. Physics of condensed matter. Statistical mechanics, electronic, optical and magnetic properties. 1996, Vol 74, Num 2, pp 199-209 ; ref : 15 ref
- ISSN
- 1364-2812
- Scientific domain
- Condensed state physics
- Publisher
- Taylor & Francis, London
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Keyword (fr)
- Addition hydrogène Cinétique Commande processus Composé binaire Couche mince Etat amorphe Etude expérimentale Impureté Microscopie force atomique Microstructure Morphologie Méthode PECVD Propriété volume Relation fabrication propriété Réaction surface Silicium carbure Spectre IR Spectre RPE Surface C Si a-SiC:H Composé minéral
- Keyword (en)
- Hydrogen additions Kinetics Process control Binary compounds Thin films Amorphous state Experimental study Impurities Atomic force microscopy Microstructure Morphology PECVD Bulk properties Fabrication property relation Surface reactions Silicon carbides Infrared spectra EPR spectra Surfaces Inorganic compounds
- Keyword (es)
- Relación fabricación propiedad
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H35 Solid surfaces and solid-solid interfaces / 001B60H35B Surface structure and topography
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness
- Discipline
- Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 3263703
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1080/01418639608240336 
https://dx.doi.org/10.1080/01418639608240336
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