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Magnetic properties and texture of sputtered Fe/Fe3O4 multilayer films

Author
KIM, Y. K; OLIVERIA, M
MIT, dep. materials sci. eng., Cambridge MA 02139, United States
Source

IEEE transactions on magnetics. 1994, Vol 30, Num 3, pp 1316-1323 ; ref : 17 ref

CODEN
IEMGAQ
ISSN
0018-9464
Scientific domain
Electronics; Metallurgy, welding; Condensed state physics
Publisher
Institute of Electrical and Electronics Engineers, New York, NY
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Champ coercitif Couche mince Couche multimoléculaire Effet température Epaisseur Etude expérimentale Fer oxyde Fer Grosseur grain Magnétite Magnétron Microstructure Orientation grain Polycristal Propriété magnétique Pulvérisation irradiation Pulvérisation réactive Saturation magnétique Spectrométrie Auger Texture XRD
Keyword (en)
Coercive force Thin films Multilayer Temperature effects Thickness Experimental study Iron oxides Iron Grain size Magnetite Magnetrons Microstructure Grain orientation Polycrystals Magnetic properties Sputtering Reactive sputtering Magnetic saturation AES Texture XRD
Keyword (es)
Campo coercitivo Capa multimolecular Saturación magnética
Keyword (de)
Koerzitivfeldstaerke Magnetische Saettigung
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70E Magnetic properties and materials / 001B70E70 Magnetic properties of surface, thin films and multilayers / 001B70E70A Magnetic properties of monolayers and thin films

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy

Pacs
7570A Magnetic properties of monolayers and thin films

Discipline
Metals. Metallurgy Physics of condensed state : electronic structure, electrical, magnetic and optical properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
3307651

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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